Lithographic apparatus
AssigneeASML Netherlands B.V.
InventorsMartinus Hendrikus Antonius Leenders, Nicolaas Ten Kate, Nicolaas Rudolf Kemper, Joost Jeroen Ottens, Marcel Beckers, Johannes Petrus Maria Smeulers, Michel Riepen, Sergei Shulepov
Life of this patent
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Abstract
A barrier member is provided for use in immersion lithography. The barrier member includes an extractor assembly on a bottom surface configured to face the substrate. The extractor assembly includes a plate configured to split the space between a liquid removal device and the substrate in two such that a meniscus is formed in an upper channel between the liquid removal device and the plate and below the plate between the plate and the substrate.
Claims44
A lithographic apparatus, comprising:
- a barrier member configured to surround a space between a projection system and a substrate and to at least partly constrain liquid in the space, the barrier member comprising:
- an extractor configured to remove liquid from between the barrier member and the substrate, and
- a plate located between the extractor and the substrate such that a first channel, open to the space and to the extractor, is formed between the extractor and the plate and a second radially extending channel, open to the space, is formed between the plate and the substrate, wherein the first channel has, in use, an under pressure other than from the extractor or has, in use, an atmospheric pressure, and wherein, in use, liquid flows into the first channel to form a meniscus extending from the extractor in the channel.
A lithographic apparatus, comprising:
- a liquid supply system including a barrier member which surrounds a space between a projection system and a substrate and configured to form a contactless seal between the barrier member and the substrate;
- a liquid removal device configured to remove liquid and which surrounds the space and has an inlet which extends in the radial direction, the removal capacity of the liquid removal device being dependent on an amount of the inlet being covered by liquid;
- and
- a radially inwardly extending projection positioned between the inlet and the substrate to split the area between the inlet and the substrate in two, wherein, in use, a meniscus extends from the inlet in the area between the inlet and the projection.
Dependencies are inferred from the claim text.