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US 7,804,574 B2Granted
Lithographic apparatus and device manufacturing method using acidic liquid
AssigneeASML Netherlands B.V.
InventorsBob Streefkerk, Marcel Mathijs Theodore Marie Dierichs, Wendy Fransisca Johanna Gehoel-Van Ansem
Life of this patent
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Abstract
A lithographic apparatus and device manufacturing method is provided in which exposure is carried out by projecting through a liquid having a pH of less than 7, the liquid being in contact with a substrate to be exposed. The liquid advantageously comprises an anti-reflective topcoat.
Claims49
A lithographic projection apparatus comprising:
- an illuminator arranged to condition a beam of radiation;
- a support structure configured to hold a patterning device, the patterning device capable of imparting a pattern to the beam;
- a substrate table configured to hold a substrate;
- a projection system arranged to project the patterned beam onto a target portion of the substrate;
- and
- a liquid supply system configured to provide a liquid to a space between the projection system and the substrate, the liquid being an aqueous solution having a pH of less than or equal to 6.5 in the lithographic projection apparatus prior to exit from an outlet into the space to contact with the projection system and/or the substrate in the space.
3 more elements
A device manufacturing method comprising:
- supplying a liquid onto a radiation-sensitive resist on a substrate, the liquid comprising an aqueous solution having a pH of less than or equal to 6.5 just prior to exit from an outlet onto the substrate to contact with the substrate;
- and
- projecting a patterned beam of radiation, through the liquid onto a target portion of the radiation-sensitive resist on the substrate.
A device manufacturing method, comprising:
- adding an acid to a liquid to form an acidified liquid prior to exit from an outlet into a space between a projection system and a substrate, to contact with the projection system and/or the substrate;
- feeding the acidified liquid to the space;
- and
- projecting a patterned beam of radiation, through the projection system and the acidified liquid, onto a target portion of radiation-sensitive resist on the substrate.
1 more element
Dependencies are inferred from the claim text.