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US 7,804,153 B2Granted
Semiconductor device preventing bridge between fuse pattern and guard ring
AssigneeSamsung Electronics Co., Ltd.
InventorsKwang-kyu Bang, Jun-ho Jang, Yoo-mi Lee
Life of this patent
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Abstract
A semiconductor device having a fuse structure that can prevent a bridge between a fuse pattern and a guard ring, and a method of fabricating the same are provided. The fuse pattern formed on a multiple-layered metal interconnect layer is stepped shape increasing a vertical distance between the fuse pattern and the guard ring.
Claims16
A semiconductor device formed on a semiconductor substrate, comprising:
- a first interlayer insulating layer formed on a substrate and having a lower surface and an upper surface;
- a second interlayer insulating layer formed on the first interlayer insulating layer;
- a trench formed though the first interlayer insulating layer and having a trench bottom and opposing trench sidewalls;
- a stepped fuse pattern formed on the trench bottom and opposing trench sidewalls, such that the stepped fuse pattern comprises a bottom portion extending along the trench bottom and rising sidewall portions formed respectively on the trench sidewalls, wherein each sidewall portion comprises a lower end disposed at the trench bottom and an upper end disposed on the upper surface of the first interlayer insulating layer, such that only the bottom portion of the stepped fuse pattern is configured to receive laser radiation during a fuse cutting operation;
- a fuse opening exposing the fuse pattern through the second interlayer insulating layer;
- and
- a guard ring surrounding the fuse opening, wherein the guard ring comprises metal patterns formed on the first interlayer insulating layer and formed on the second interlayer insulating layer, and the fuse opening exposes a portion of the metal patterns.
4 more elements
A semiconductor device formed on a semiconductor substrate, comprising:
- a first interlayer insulating layer formed on a substrate and having a lower surface and an upper surface;
- a second interlayer insulating layer formed on the first interlayer insulating layer;
- a passivation layer formed on the second interlayer insulating layer;
- a trench formed though the first interlayer insulating layer and having a trench bottom and opposing trench sidewalls;
- a stepped fuse pattern formed on the trench bottom and opposing trench sidewalls, such that the stepped fuse pattern comprises a bottom portion extending along the trench bottom and rising sidewall portions formed respectively on the trench sidewalls, wherein each sidewall portion comprises a lower end disposed at the trench bottom and an upper end disposed on the upper surface of the first interlayer insulating layer, such that only the bottom portion of the stepped fuse pattern is configured to receive laser radiation during a fuse cutting operation;
- a fuse opening exposing the fuse pattern through the second interlayer insulating layer and the passivation layer;
- and
- a guard ring surrounding the fuse opening, wherein the guard ring comprises metal patterns formed on the first interlayer insulating layer and on the second interlayer insulating layer, and the fuse opening exposes a portion of the metal patterns.
5 more elements
Dependencies are inferred from the claim text.