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AssigneeNikon Corporation
InventorHiroyuki Nagasaka
Estimating the term…
An exposure method for exposing a predetermined area on a substrate includes an operation for executing first exposure for the predetermined area by forming a liquid immersion area of a first liquid on the substrate, and an operation for executing second exposure for the predetermined area by forming a liquid immersion area of a second liquid different from the first liquid, on the substrate on which the first exposure has been executed, wherein the surface state of the substrate in the second exposure is allowed to differ from the surface state of the substrate in the first exposure. Even when the substrate is subjected to the first exposure and the second exposure by using the liquid immersion method, then the liquid immersion area of the liquid can be satisfactorily formed on the substrate in each of the exposure processes, and the substrate can be exposed satisfactorily.
An exposure method for exposing a predetermined area on a substrate, the exposure method comprising:
An exposure method for exposing a predetermined area of a substrate, the exposure method comprising:
A substrate processing method for forming a film on a base material of a substrate on which first exposure and second exposure are to be performed, the substrate processing method comprising:
Dependencies are inferred from the claim text.