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US 7,803,503 B2Granted
Halftone mask and method for making pattern substrate using the halftone mask
AssigneeMitsubishi Electric Corporation
InventorKazushi Yamayoshi
Life of this patent
Estimating the term…
Abstract
A halftone mask includes translucent film patterns for forming a middle gradation area and light blocking film patterns disposed to an entire periphery of the translucent film patterns.
Claims6
A halftone mask comprising:
- a translucent film pattern for forming a middle gradation area;
- and
- a light blocking film pattern disposed to an entire periphery of the translucent film pattern, at least one portion of the light blocking film pattern including a micropattern formed with a line width smaller than a resolution of a lithography device to block a higher amount of light transmitted from the lithography device than a portion of the light blocking film pattern not including the micropattern.
Dependencies are inferred from the claim text.