US 7,803,230 B2 · Substrate cleaning apparatus, substrate cleaning method, and medium for recording program used for the method

Abstract

In a substrate cleaning method and a substrate cleaning method according to the present invention, a brush 3 is brought into contact with a substrate W while rotating the same, and a cleaning position Sb of the brush 3 is moved relative to the substrate W from a center part of the substrate W toward a peripheral part thereof. A process fluid formed of liquid droplets and a gas is sprayed by a two-fluid nozzle 5 onto the substrate W, and a cleaning position Sn of the two-fluid nozzle 5 is moved relative to the substrate W from a center part of the substrate W toward a peripheral part thereof. During the movement of the cleaning position Sb of the brush 3 from the center part of the substrate W toward the peripheral part thereof, the cleaning position Sb of the two-fluid nozzle is positioned nearer to a center P0 than the cleaning position Sb of the brush 3. Since contaminations of the brush are prevented from adhering again to the wafer, it can be avoided that the wafer W is contaminated.

Claims10

Dependent claims

A substrate cleaning method for cleaning a substrate by bringing a brush into contact with the substrate while rotating the same, and by spraying liquid droplets from a two-fluid nozzle onto the substrate, wherein

the brush and the two-fluid nozzle are moved radially outward relative to a center of the substrate, while a cleaning position of the two-fluid nozzle is kept nearer to the center of the substrate than a cleaning position of the brush,
the cleaning position of the brush and the cleaning position of the two-fluid nozzle are moved in directions opposite to each other,
the cleaning position of the two-fluid nozzle is moved radially outward to a periphery of the substrate relative to the center of the substrate to areas where the brush has been in contact with the substrate,
a moving speed of the cleaning position of the two-fluid nozzle relative to the substrate is higher than a moving speed of the cleaning position of the brush relative to the substrate, and
a difference between a distance from the center of the substrate to the cleaning position of the brush and a distance from the center of the substrate to the cleaning position of the two-fluid nozzle becomes gradually smaller, as the cleaning position of the brush approaches the periphery of the substrate.

2 more elements

A medium for recording a program that allows a computer to execute the procedures of bringing a brush into contact with a substrate while rotating the same, and spraying liquid droplets from a two-fluid nozzle onto the substrate, wherein

the brush and the two-fluid nozzle are moved radially outward relative to a center of the substrate, while a cleaning position of the two-fluid nozzle is kept nearer to the center of the substrate than a cleaning position of the brush,
the cleaning position of the brush and the cleaning position of the two-fluid nozzle are moved in directions opposite to each other,
the cleaning position of the two-fluid nozzle is moved radially outward to a periphery of the substrate relative to the center of the substrate to areas where the brush has been in contact with the substrate,
a moving speed of the cleaning position of the two-fluid nozzle relative to the substrate is higher than a moving speed of the cleaning position of the brush relative to the substrate, and
a difference between a distance from the center of the substrate to the cleaning position of the brush and a distance from the center of the substrate to the cleaning position of the two-fluid nozzle becomes gradually smaller, as the cleaning position of the brush approaches the periphery of the substrate.

2 more elements

Dependencies are inferred from the claim text.

Substrate cleaning apparatus, substrate cleaning method, and medium for recording program used for the method

Life of this patent

Substrate cleaning apparatus, substrate cleaning method, and medium for recording program used for the method

Life of this patent

Abstract

Claims10