Apparatus and method of forming an applied film
AssigneeTokyo Electron Limited
InventorsKousuke Yoshihara, Hiroichi Inada
Life of this patent
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Abstract
There is provided an apparatus including: a processing cup having an opening opened upward to allow a substrate to be loaded and unloaded, an exhaust port for exhausting an unnecessary atmosphere produced in forming a film applied on the substrate, and an aspiration port for aspirating external air; and an aspiration device aspirating the unnecessary atmosphere through the exhaust port, wherein when the substrate is accommodated in the opening of the processing cup, the substrate has a perimeter spaced from the opening by a predetermined gap, and below the substrate accommodated in the processing cup there is formed an exhaust flow path extending from the aspiration port to the exhaust port.
Claims16
An apparatus that drops on a substrate a liquid to be applied thereon and rotates said substrate to cause a force to disperse said liquid in a form of a film to form a film applied on an upper surface of said substrate, comprising:
- means for holding and rotating said substrate substantially horizontally;
- means for feeding and dropping said liquid to be applied onto said upper surface of said substrate;
- a processing cup including
- an opening opened upward to allow said substrate to be loaded and unloaded,
- an exhaust port for exhausting an unnecessary atmosphere produced in forming said film applied on said substrate,
- and an aspiration port for aspirating external air;
- and
- means for aspirating said unnecessary atmosphere through said exhaust port,
- wherein when said substrate is accommodated in said opening of said processing cup, said substrate has a perimeter spaced from said opening by a predetermined gap and substantially separates a processing space located above said substrate and a space located below said substrate, and below said substrate accommodated in said processing cup there is formed an exhaust flow path extending from said aspiration port to said exhaust port, with said predetermined gap and said exhaust flow path communicating with each other,
- wherein said processing cup includes
- an outer peripheral member surrounding an outer side of said substrate,
- an air stream controlling member disposed within said outer peripheral member, said air stream controlling member being under and adjacent to said substrate and surrounding said means for substantially horizontally holding and thus rotating said substrate,
- and an internal cup disposed within said outer peripheral member and below said air stream controlling member,
- wherein said outer peripheral member includes a first vertical wall in the form of a cylinder and an inner peripheral portion defining said opening,
- wherein said air stream controlling member includes a wall that forms said exhaust flow path,
- wherein said internal cup includes
- a second vertical wall corresponding with said first vertical wall of the outer peripheral member to define said aspiration port, and
- a bottom portion disposed at a lower end of an inside of said second vertical wall, said bottom portion being proximate to said exhaust port.
An apparatus that drops on a substrate a liquid to be applied thereon and rotates said substrate to cause a force to disperse said liquid in a form of a film to form a film applied on an upper surface of said substrate, comprising:
- a substrate holding and rotating device holding and rotating said substrate substantially horizontally;
- a device feeding and dropping said liquid to be applied onto said upper surface of said substrate;
- a processing cup having including
- an opening opened upward to allow said substrate to be loaded and unloaded,
- an exhaust port for exhausting an unnecessary atmosphere produced in forming said film applied on said substrate,
- and an aspiration port for aspirating external air;
- and
- an aspiration device aspirating said unnecessary atmosphere through said exhaust port,
- wherein when said substrate is accommodated in said opening of said processing cup, said substrate has a perimeter spaced from said opening by a predetermined gap and substantially separates a processing space located above said substrate and a space located below said substrate, and below said substrate accommodated in said processing cup there is formed an exhaust flow path extending from said aspiration port to said exhaust port, with said predetermined gap and said exhaust flow path communicating with each other,
- wherein said processing cup includes
- an outer peripheral member surrounding an outer side of said substrate,
- an air stream controlling member disposed within said outer peripheral member, said air stream controlling member being under and adjacent to said substrate and surrounding said substrate holding and rotating device,
- and an internal cup disposed within said outer peripheral member and below said air stream controlling member,
- wherein said outer peripheral member includes a first vertical wall in the form of a cylinder and an inner peripheral portion defining said opening,
- wherein said air stream controlling member includes a wall that forms said exhaust flow path,
- wherein said internal cup includes
- a second vertical wall corresponding with said first vertical wall of the outer peripheral member to define said aspiration port, and
- a bottom portion disposed at a lower end of an inside of said second vertical wall, said bottom portion being proximate to said exhaust port.
An apparatus that drops on a substrate a liquid to be applied thereon and rotates said substrate to cause a force to disperse said liquid in a form of a film to form a film applied on an upper surface of said substrate, comprising:
- means for substantially horizontally holding and thus rotating said substrate;
- means for feeding said liquid to be applied, dropping said liquid to be applied onto said upper surface of said substrate;
- a processing cup having an opening opened upward to allow said substrate to be loaded and unloaded, an exhaust port for exhausting an unnecessary atmosphere produced in forming said film applied on said substrate, and an aspiration port for aspirating external air;
- and
- means for aspirating said unnecessary atmosphere through said exhaust port, wherein when said substrate is accommodated in said opening of said processing cup, said substrate has a perimeter spaced from said opening by a predetermined gap and substantially separates a processing space located above said substrate and a space located below said substrate, and below said substrate accommodated in said processing cup there is formed an exhaust flow path extending from said aspiration port to said exhaust port, with said predetermined gap and said exhaust flow path communicating with each other,
- wherein said aspiration port is provided with a sensor measuring aspirated air in flow rate, and
- wherein in said exhaust flow path downstream of said sensor, means is provided for preventing said unnecessary atmosphere from flowing backward into said aspiration port.
An apparatus that drops on a substrate a liquid to be applied thereon and rotates said substrate to cause a force to disperse said liquid in a form of a film to form a film applied on an upper surface of said substrate, comprising:
- a substrate holding and rotating device substantially horizontally holding and thus rotating said substrate;
- a device feeding said liquid to be applied, dropping said liquid to be applied onto said upper surface of said substrate;
- a processing cup having an opening opened upward to allow said substrate to be loaded and unloaded, an exhaust port for exhausting an unnecessary atmosphere produced in forming said film applied on said substrate, and an aspiration port for aspirating external air;
- and
- an aspiration device aspirating said unnecessary atmosphere through said exhaust port, wherein when said substrate is accommodated in said opening of said processing cup, said substrate has a perimeter spaced from said opening by a predetermined gap and substantially separates a processing space located above said substrate and a space located below said substrate, and below said substrate accommodated in said processing cup there is formed an exhaust flow path extending from said aspiration port to said exhaust port, with said predetermined gap and said exhaust flow path communicating with each other,
- wherein said aspiration port is provided with a sensor measuring aspirated air in flow rate, and
- wherein in said exhaust flow path downstream of said sensor, a backflow preventing portion is provided to prevent said unnecessary atmosphere from flowing backward into said aspiration port.
Dependencies are inferred from the claim text.