Method for producing a vertical field effect transistor

A vertical field effect transistor comprising a projection formed on a substrate for forming a channel region of a field effect transistor;

• a control electrode region of a control electrode of the field effect transistor formed on mutually opposite sides of the projection;
• an insulating region arranged between the control electrode regions and the projection electrically insulating and adjoining the channel region;
• a first connection region near the substrate at one end of the channel region;
• a second connection region remote from the substrate at the other end of the channel region, the control electrode having a planar interface which lies parallel to a base area of the projection near the substrate;
• wherein the control electrode is delimited by the planar interface in at least ninety percent of its region in the direction of normal (N) to the base area, away from the substrate;
• at least one charge storage region arranged between an insulating region and a control electrode region;
• wherein the charge storage region is contained in a charge storage material having a further planar interface remote from the substrate, said further planar interface lying parallel to the base area of the projection;
• wherein the charge storage material is delimited by the further planar interface remote from the substrate at least ninety percent of its region in the direction of the normal (N) to the base area, away from the substrate;
• and
• wherein the control region has been set back further than the charge storage region, or that the control electrode overlaps the change storage region in the direction of normal (N).