Image sensor with embedded photodiode region and manufacturing method for same

A CMOS image sensor, comprising:

• a pixel region in which are formed a plurality of pixels each having at least a photodiode, a reset transistor, and a source-follower transistor;
• and
• a peripheral circuit region in which are formed peripheral circuits which process signals read out from the pixels, wherein
• in the peripheral circuit region, within a first well region of a first conduction type at the substrate surface, a second conduction type source-drain region of transistors configuring the peripheral circuits is formed;
• and
• in the pixel region, in a first conduction type second well region shallower than the first well region, a second conduction type source-drain region of the reset transistor and source-follower transistor is formed, and a second conduction type first photodiode region extending in the depth direction from the vicinity of the substrate surface and a second photodiode region, embedded extending from the first photodiode region to the side below the second well region in which is formed the source-drain region of the reset transistor or source-follower transistor, are formed.