Electrostatic charge measurement method, focus adjustment method, and scanning electron microscope
AssigneeHitachi High-Technologies Corporation
InventorsTatsuaki Ishijima, Katsuhiro Sasada, Ritsuo Fukaya
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AssigneeHitachi High-Technologies Corporation
InventorsTatsuaki Ishijima, Katsuhiro Sasada, Ritsuo Fukaya
Estimating the term…
A method and a device are disclosed for suppressing error in electrostatic charge amount or defocus on the basis of electrostatic charge storage due to electron beam scanning when measuring the electrostatic charge amount of the sample or a focus adjustment amount by scanning the electron beam. An electrostatic charge measurement method, a focus adjustment method, or a scanning electron microscope for measuring an electrostatic charge amount or controlling an application voltage to the sample changes the application voltage to the energy filter while moving the scanning location of the electron beam on the sample.
An electrostatic charge measurement method for measuring electrostatic charge of a sample on the basis of secondary electron emission detection, comprising:
A scanning electron microscope comprising an electron source, a scan deflector for scanning an electron beam emitted from the electron source on a sample, a detector for detecting secondary electron emission obtained based on the electron beam scanning on the sample;
A method of adjusting a focus of an electron beam on the basis of detected secondary electron comprising:
Dependencies are inferred from the claim text.