Method of manufacturing an inkjet head through the anodic bonding of silicon members

Abstract

In a method of manufacturing an inkjet head, a silicon dioxide (SiO2) layer is produced on the surface of first silicon member formed from single-crystal silicon. Next, a glass layer formed of borosilicate glass or the like is sputtered onto the surface of the silicon dioxide (SiO2) layer. A silicon oxide (SiOx, x<2) layer is then formed on the surface of a second silicon member. The first and second silicon members and are bonded together by applying heat at about 450° C. with heaters, as a DC voltage is applied across electrode terminals. As a result, a silicon dioxide (SiO2) layer is formed at the interface of the glass layer and silicon oxide (SiOx, x<2) layer, anodically bonding the two layers.

Dependencies are inferred from the claim text.