Manufacturing method of semiconductor device

A manufacturing method of a semiconductor device, comprising the steps of:

• preparing a mother chip and a daughter chip,
• the mother chip including a first substrate
• first electrodes and second electrodes,
• a first passivation film formed on the first substrate and having openings exposing upper surfaces of the first and second electrodes;
• first barrier metal formed on the upper surface of the first and second electrodes, respectively, and on the first passivation film,
• first metal posts formed on the first barrier metal of the first and second electrodes, respectively, and
• solder balls on the first metal posts above the first electrodes;
• the daughter chip including a second substrate
• third electrodes,
• a second passivation film formed on the second substrate and having openings exposing upper surfaces of the third electrodes;
• second barrier metal formed on the upper surface of the third electrodes, respectively, and on the second passivation film;
• second metal posts on the second barrier metal of the third electrodes, respectively, and
• making flip chip bonding of a daughter chip on the mother chip to electrically connect the second metal posts to the first metal posts for the second electrodes, respectively, and making flip chip bonding of the mother chip on a circuit board using the solder balls.