Pattern forming method and pattern forming system
AssigneeHitachi, Ltd.
InventorsSouichi Katagiri, Yasunari Sohda, Masahiko Ogino
Life of this patent
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Abstract
Method of forming a pattern by a nanoimprint technique starts with preparing a mold with nanostructures on its surface. The mold is pressed against a substrate or plate coated with a resin film. The positions of alignment marks formed on the rear surface of the plate coated with the resin film are detected. Thus, a relative alignment between the mold and the plate coated with the resin film is performed.
Claims17
A pattern forming method for forming a pattern by pressing a mold with nanostructures on its surface against a plate coated with a resin film by the use of nanoimprinting, said method comprising the steps of:
- performing a relative alignment between the mold and the plate coated with the resin film by detecting positions of alignment marks formed on a rear surface of the plate coated with the resin film;
- measuring a distance between the mold and the plate coated with the resin film;
- stopping the mold immediately before it comes into contact with the plate coated with the resin film;
- aligning a relative position between the mold and the plate coated with the resin film within a plane in which the nanostructures will be formed;
- and pressing the mold against the plate coated with the resin film while maintaining the relative position.
A pattern forming method for forming a pattern by pressing a mold with nanostructures on its surface against a plate coated with a resin film by the use of nanoimprinting, said method comprising the steps of:
- performing a relative alignment between the mold and the plate coated with the resin film by detecting positions of alignment marks formed on a rear surface of the plate coated with the resin film;
- measuring a distance between the mold and the plate coated with the resin film at plural positions;
- stopping the mold immediately before it comes into contact with the plate coated with the resin film;
- aligning the relative position between the mold and the plate coated with the resin film within a plane in which the nanostructures will be formed into a given relationship;
- and
- pressing the mold against the plate coated with the resin film while maintaining the relative position and securing parallelism between the mold and the plate based on the distance between the mold and the plate measured at the plural positions.
A pattern forming method for forming a pattern by pressing a mold with nanostructures on its surface against a plate coated with a resin film by the use of nanoimprinting, said method comprising the steps of:
- performing a relative alignment between the mold and the plate coated with the resin film by detecting positions of alignment marks formed on a rear surface of the plate coated with the resin film;
- wherein positions on a front surface of the plate which correspond to positions on a rear surface of the plate are detected by finding a phase difference (φ) between beams of light illuminating at least two points of the alignment marks formed on the rear surface of the plate.
A pattern forming system for forming a pattern by pressing a mold with nanostructures on its surface against a plate coated which a resin film by the use of nanoimprinting, said pattern forming system comprising:
- means for pressing the mold against the plate coated with the resin film;
- and
- means for performing a relative alignment between the mold and the plate coated with the resin film within a plane in which the nanostructures will be formed by detecting positions of alignment marks formed on a rear surface of the plate coated with the resin film;
- means for measuring a distance between the mold and the plate coated with the resin film;
- and
- means for applying a load while maintaining the position of the mold relative to the plate coated with the resin film within the plane in which the nanostructures will be formed.
A pattern forming system for forming a pattern by pressing a mold with nanostructures on its surface against a plate coated which a resin film, said pattern forming system comprising:
- a plate stage for holding the plate coated with the resin film;
- stage-driving means capable of moving the plate stage into a given position;
- a mold stage for holding the mold;
- rear surface position detectors for detecting positions of alignment marks formed on a rear surface of the plate coated with the resin film;
- a mold position detector for detecting a position of a plane in which the nanostructures will be formed on the mold;
- and
- means for performing a relative alignment between the plate and the mold based on results of the detections performed by the rear surface detectors and mold position detector.
Dependencies are inferred from the claim text.