Composition for coating over a photoresist pattern
AssigneeAZ Electronic Materials USA Corp.
InventorsMuthiah Thiyagarajan, Yi Cao, Sung Eun Hong, Ralph R. Dammel
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Abstract
The present invention relates to an aqueous coating composition for coating a photoresist pattern, comprising a polymer comprising at least one unit with an alkylamino group, where the unit has a structure (1), where, R1 to R5 are independently selected from hydrogen and C1 to C6 alkyl, and W is C1 to C6 alkyl. The invention also relates to a process for imaging a photoresist layer using the present composition.
Claims19
An aqueous coating composition for coating a photoresist pattern, comprising a polymer soluble in water and comprising at least one unit with an alkylamino group, where the unit has a structure (1),
- where, R1 to R5 are independently selected from hydrogen and C1 to C6 alkyl, and W is C1 to C6 alkylene, further where the composition is free of carboxylic acid group.
A process for manufacturing a microelectronic device, comprising;
- a) providing a substrate with a photoresist pattern;
- b) coating the photoresist pattern with an aqueous coating composition for coating a photoresist pattern, comprising a polymer comprising at least one unit with an alkylamino group, where the unit has a structure (1),
- where, R1 to R5 are independently selected from hydrogen and C1 to C6 alkyl, and W is C1 to C6 alkylene, further where the composition is free of carboxylic acid goup;
- c) reacting a portion of the coating material in contact with the photoresist pattern;
- d) removing a portion of the coating material which is not reacted with a removal solution.
An aqueous coating composition for coating a photoresist pattern, comprising a single polymer, where the polymer comprises at least one unit with an alkylamino group of structure (1) and at least one monomeric unit selected from,
- and where structure (1) is,
- where, R1 to R5 are independently selected from hydrogen and C1 to C6 alkyl, and W is C1 to C6 alkylene, further where the composition is free of carboxylic acid group.
Dependencies are inferred from the claim text.