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US 7,744,802 B2Granted
Dielectric film with low coefficient of thermal expansion (CTE) using liquid crystalline resin
AssigneeIntel Corporation
InventorJames C. Matayabas, Jr.
Life of this patent
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Abstract
An embodiment of the present invention is a technique to provide a dielectric film material with a controllable coefficient of thermal expansion (CTE). A first compound containing a first liquid crystalline component is formed. The first compound is cast into a first film. The first film is oriented in an magnetic or electromagnetic field in a first direction. The first film is cured at a first temperature.
Claims11
A method comprising:
- forming a first compound containing a first liquid crystalline component;
- casting the first compound into a first film;
- orienting the first film in a magnetic or electromagnetic field in a first direction to control a coefficient of thermal expansion (CTE) of the first film;
- curing the first film at a first temperature;
- forming a dielectric layer including the cured first film;
- and
- depositing the dielectric layer on a substrate layer in a semiconductor package, the substrate layer having a CTE that matches with CTE of the dielectric layer;
- wherein forming the dielectric layer comprises:
- forming a second compound containing a second liquid crystalline component;
- casting the second compound into a second film;
- orienting the second film in the magnetic or electromagnetic field in a second direction different than the first direction;
- and
- forming a multilayer as the dielectric layer including at least the first and second films.
10 more elements
Dependencies are inferred from the claim text.