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US 7,744,438 B2Granted
Production apparatus and method of producing a light-emitting device by using the same apparatus
AssigneeSemiconductor Energy Laboratory Co., Ltd.
InventorsShunpei Yamazaki, Takashi Hamada, Satoshi Seo
Life of this patent
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Abstract
The present invention relates to a method for manufacturing a light-emitting device. At least one of a light-emitting film forming step, a conductive film forming step and an insulating film forming step is carried out while holding a substrate in a manner that an angle subtended by a surface of the substrate and the direction of gravity is within a range of from 0 to 30°.
Claims36
An apparatus comprising:
- a loading chamber;
- a first chamber for forming a light-emitting film by a liquid jet method;
- a second chamber for forming a conductive film by a sputtering method;
- a third chamber for forming an insulating film by a sputtering method;
- and
- an unloading chamber,
- wherein a substrate is so supported that an angle subtended by a surface of the substrate to be treated and the direction of gravity is within from 0 to 30° in all of the loading chamber, the first chamber to the third chamber and the unloading chamber.
4 more elements
An apparatus comprising:
- a loading chamber;
- a common chamber;
- a first chamber for forming a light-emitting film by a liquid jet method;
- a second chamber for forming a conductive film by a sputtering method;
- a third chamber for forming an insulating film by a sputtering method;
- and
- an unloading chamber,
- wherein a substrate is so supported that an angle subtended by a surface of the substrate to be treated and the direction of gravity is within from 0 to 30° in all of the loading chamber, the common chamber, the first chamber to the third chamber and the unloading chamber.
5 more elements
An apparatus comprising:
- a loading chamber;
- a first chamber for forming a light-emitting film by a printing method;
- a second chamber for forming a conductive film by a sputtering method;
- a third chamber for forming an insulating film by a sputtering method;
- and
- an unloading chamber,
- wherein a substrate is so supported that an angle subtended by a surface of the substrate to be treated and the direction of gravity is within from 0 to 30° in all of the loading chamber, the first chamber to the third chamber and the unloading chamber.
4 more elements
An apparatus comprising:
- a loading chamber;
- a common chamber;
- a first chamber for forming a light-emitting film by a printing method;
- a second chamber for forming a conductive film by a sputtering method;
- a third chamber for forming an insulating film by a sputtering method;
- and
- an unloading chamber,
- wherein a substrate is so supported that an angle subtended by a surface of the substrate to be treated and the direction of gravity is within from 0 to 30° in all of the loading chamber, the common chamber, the first chamber to the third chamber and the unloading chamber.
5 more elements
An apparatus comprising:
- a loading chamber;
- a first chamber for forming a light-emitting film by a spray method;
- a second chamber for forming a conductive film by a sputtering method;
- a third chamber for forming an insulating film by a sputtering method;
- and
- an unloading chamber,
- wherein a substrate is so supported that an angle subtended by a surface of the substrate to be treated and the direction of gravity is within from 0 to 30° in all of the loading chamber, the first chamber to the third chamber and the unloading chamber.
4 more elements
An apparatus comprising:
- a loading chamber;
- a common chamber;
- a first chamber for forming a light-emitting film by a spray method;
- a second chamber for forming a conductive film by a sputtering method;
- a third chamber for forming an insulating film by a sputtering method;
- and
- an unloading chamber,
- wherein a substrate is so supported that an angle subtended by a surface of the substrate to be treated and the direction of gravity is within from 0 to 30° in all of the loading chamber, the common chamber, the first chamber to the third chamber and the unloading chamber.
5 more elements
Dependencies are inferred from the claim text.