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US 7,743,503 B2Granted
Method for manufacturing inkjet head
AssigneeCanon Kabushiki Kaisha
InventorsTakehito Okabe, Nobuhiko Sato, Makoto Kurotobi, Kenichi Takeda, Toshihiro Ifuku
Life of this patent
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Abstract
A method for manufacturing an inkjet head includes providing a piezoelectric substrate having a porous structure, a diaphragm on the porous structure, and a piezoelectric substance layer on the diaphragm, and forming a cavity by etching out the porous structure from the piezoelectric substrate.
Claims8
A method for manufacturing an inkjet head, comprising steps of:
- forming an anodization-resistant film on a predetermined area of one surface of a substrate made of single-crystal silicon;
- forming a porous structure by making at least a part of an area of the one surface of the substrate on which the anodization-resistant film is not formed porous by an anodization method;
- removing the anodization-resistant film;
- forming a non-porous single crystal diaphragm on the one surface of the substrate including the porous structure by epitaxial growth;
- forming a piezoelectric substance layer on the diaphragm formed on the porous structure;
- reducing a thickness of the substrate from a side of another surface of the substrate;
- and
- forming a cavity by etching out the porous structure from the substrate.
5 more elements
Dependencies are inferred from the claim text.