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US 7,743,487 B2Granted
Method to planarize perpendicular write poles using a combination of CMP and reactive ion milling
AssigneeHitachi Global Storage Technologies Netherlands B.V.
InventorsAmanda Baer, Hamid Balamane, Michael Feldbaum, Ming Jiang, Aron Pentek, Neil Leslie Robertson, Sue Siyang Zhang
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Abstract
A perpendicular write head includes a beveled main pole having corners defining a track width and having a planarized surface and encapsulated on either side thereof and below by an alumina layer, the alumina layer having a polished surface and extending above the main pole on either side thereof as steps.
Claims19
A method of manufacturing a perpendicular write head comprising:
- forming a mill mask upon a laminate layer;
- depositing a first hark mask upon the mill mask;
- depositing a second hard mask upon the first hard mask;
- depositing a third hard mask upon the second hard mask;
- depositing a photoresist layer upon the third hard mask;
- removing the photoresist layer and the third hard mask;
- removing the second hard mask;
- milling the mill mask and the first hard mask to form a beveled main pole;
- depositing alumina on top of and around the beveled main pole to encapsulate the beveled main pole;
- polishing the deposited alumina to a level above the mill mask;
- milling the polished alumina to expose a portion of the mill mask;
- and
- removing the first hard mask and the mill mask.
10 more elements
Dependencies are inferred from the claim text.