Allocating processing units to generate simulated diffraction signals used in optical metrology
AssigneeTokyo Electron Limited
InventorsHemalatha Erva, Hong Qiu, Junwei Bao, Vi Vuong
Life of this patent
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AssigneeTokyo Electron Limited
InventorsHemalatha Erva, Hong Qiu, Junwei Bao, Vi Vuong
Estimating the term…
In allocating processing units of a computer system to generate simulated diffraction signals used in optical metrology, a request for a job to generate simulated diffraction signals using multiple processing units is obtained. A number of processing units requested for the job to generate simulated diffraction signals is then determined. A number of available processing units is determined. When the number of processing units requested is greater than the number of available processing units, a number of processing units is assigned to generate the simulated diffraction signals that is less than the number of processing units requested.
A method of utilizing computer-executable instructions for allocating processing units of a computer system to generate simulated diffraction signals in optical metrology, the computer system having a number of processing units, the method comprising:
A computer-readable medium containing computer-executable instructions for allocating processing units of a computer system to generate simulated diffraction signals in optical metrology, comprising instructions for:
A system for allocating processing units of a computer system to generate simulated diffraction signals in optical metrology, the system comprising:
Dependencies are inferred from the claim text.