Alternating phase shift mask inspection using biased inspection data
AssigneeInternational Business Machines Corporation
InventorsKaren D. Badger, Michael S. Hibbs, Christopher K. Magg
Life of this patent
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Abstract
An inspection system uses inspection data biased to compensate for mismatches that occur as a result of using an optical lithography system to print an alternating phase shift mask that operates at a wavelength of light that is different from the wavelength of light that an inspection system uses to inspect the mask for defects.
Claims17
A system for inspecting an alternating phase shift mask, comprising:
- an optical scanner configured to scan the alternating phase shift mask and generate optical image data;
- a database configured to store inspection data biased to compensate for the optical scanning response of the alternating phase shift mask with the optical scanner, wherein the biased inspection data is based on data derived from optical imaging data obtained from the optical scanner during a scan of a test alternating phase shift mask;
- and
- an image processor configured to determine if a defect is present in the alternating phase shift mask, wherein the image processor determines the presence of a defect by comparing the generated optical image data to the biased inspection data, wherein a variation between the generated optical image data and the biased inspection data that exceeds a user selectable threshold is indicative of a defect in the alternating phase shift mask.
A method for inspecting an alternating phase shift mask, comprising:
- scanning the alternating phase shift mask with an optical scanner;
- generating optical image data from the scan of the alternating phase shift mask;
- retrieving inspection data biased to compensate for the optical scanning response of the alternating phase shift mask with the optical scanner, wherein the biased inspection data is based on data derived from phase shifted optical imaging data obtained from the optical scanner during a scan of a test alternating phase shift mask;
- and
- determining if a defect is present in the alternating phase shift mask in accordance with the generated optical image data and the biased inspection data.
A computer-readable storage medium storing computer instructions for enabling an optical inspection system to determine a defect in an alternating phase shift mask, the computer instructions comprising:
- obtaining optical image data of the alternating phase shift mask generated from an optical scanner;
- retrieving inspection data biased to compensate for the optical scanning response of the alternating phase shift mask with the optical scanner, wherein the retrieved biased inspection data is based on data derived from phase shifted optical imaging data obtained from the optical scanner during a scan of a test alternating phase shift mask;
- and
- determining if a defect is present in the alternating phase shift mask in accordance with the generated optical image data and the biased inspection data.
Dependencies are inferred from the claim text.