Manufacturing method of semiconductor device

A manufacturing method of a semiconductor device comprising:

• a liquid immersion movement exposure of interposing a liquid between an exposure target substrate applied with exposure processing and a projection optical system of an exposure apparatus which carries out the exposure processing, and carrying out the exposure processing with respect to a plurality of exposure regions set on a surface of the exposure target substrate while relatively moving the exposure target substrate with respect to the projection optical system;
• a first liquid immersion movement of relatively moving the exposure target substrate with respect to the projection optical system without carrying out the exposure processing while interposing the liquid between the exposure target substrate and the projection optical system, in adjacent exposure regions of said each exposure region;
• and
• a second liquid immersion movement of relatively moving the exposure target substrate with respect to the projection optical system without carrying out the exposure processing while interposing the liquid between the exposure target substrate and the projection optical system, in a distance that is longer than a movement distance in the first liquid immersion movement, and changing at least one of a movement speed and a movement direction of the exposure target substrate with respect to the projection optical system before residual liquid occurs on the exposure target substrate;
• wherein, in the second liquid immersion movement, the relative movement direction of the exposure target substrate with respect to the protection optical system is set such that a movement trajectory of the exposure target substrate is formed in a broken-line shape or in a wobbling shape.

A manufacturing method of a semiconductor device comprising:

• a liquid immersion movement exposure of interposing a liquid between an exposure target substrate applied with exposure processing and a projection optical system of an exposure apparatus which carries out the exposure processing, and carrying out the exposure processing with respect to a plurality of exposure regions set on a surface of the exposure target substrate while relatively moving the exposure target substrate with respect to the projection optical system,
• wherein a movement speed of the exposure target substrate with respect to the projection optical system in the case where the liquid is positioned on a rim part of the exposure target substrate is set to be lower than a movement speed of the exposure target substrate with respect to the projection optical system in the case where the liquid is position at a part other than the rim part of the exposure target substrate;
• further comprising:
• a first liquid immersion movement of relatively moving the exposure target substrate with respect to the projection optical system without carrying out the exposure processing while interposing the liquid between the exposure target substrate and the projection optical system, in adjacent exposure regions of said each exposure region;
• and
• a second liquid immersion movement of relatively moving the exposure target substrate with respect to the projection optical system at a speed lower than a movement speed in the first liquid immersion movement, without carrying out the exposure processing, while interposing the liquid between the exposure target substrate and the projection optical system, in a distance that is longer than a movement distance in the first liquid immersion movement.