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US 7,742,149 B2Granted
Stage system and lithographic apparatus comprising such a stage system
AssigneeASML Netherlands B.V.
InventorsYoussef Karel Maria De Vos, Ronald Casper Kunst, Patricia Vreugdewater, Peter Paul Hempenius
Life of this patent
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Abstract
A stage system for a lithographic apparatus includes a stage, an over-determined number of actuators arranged to act on the stage, and an electric power supply configured to provide a current to the actuators, wherein the current is supplied to a coil associated with a first actuator of the actuators and to a coil associated with a second actuator of the actuators.
Claims5
A lithographic apparatus, comprising:
- an illumination system configured to condition a radiation beam;
- a patterning device support constructed to support a patterning device, the patterning device configured to impart the radiation beam with a pattern in its cross-section to form a patterned radiation beam;
- a substrate support constructed to hold a substrate;
- and
- a projection system configured to project the patterned radiation beam onto a target portion of the substrate;
- wherein at least one of the supports is supported by a stage system comprising:
- a stage,
- a plurality of electromagnetic actuators, the actuators arranged to act on the stage and being over-determined in an actuator degree of freedom, and
- a first and a second electric power supply,
- wherein, in use, a current provided by the first electric power supply is supplied to a first coil associated with a first actuator of the plurality of actuators and to a first coil associated with a second actuator of the plurality of actuators, and a current provided by the second electric power supply is supplied to a second coil associated with the first actuator of the plurality of actuators and to a second coil associated with the second actuator of the plurality of actuators such that a total power applied to the first and second coils of the first actuator by the first and the second electric power supply substantially corresponds to a total power applied to the first and second coils of the second actuator by the first and the second electric power supply.
7 more elements
A stage system for a lithographic apparatus comprising:
- a stage;
- a first and a second electromagnetic actuators that are each configured to move the stage in a substantially same direction;
- and
- a first and a second electric power supply,
- wherein, in use, a current provided by the first electric power supply is supplied to a first coil associated with the first actuator and to a first coil associated with the second actuator and a current provided by the second electric power supply is supplied to a second coil associated with the first actuator and to a second coil associated with the second actuator such that a total power applied to the first and second coils of the first actuator by the first and the second electric power supply substantially corresponds to a total power applied to the first and second coils of the second actuator by the first and the second electric power supply.
2 more elements
Dependencies are inferred from the claim text.