Exposure apparatus, method of controlling the same, and manufacturing method

A method of controlling an exposure apparatus which comprises an optical system support configured to support a projection optical system, a stage surface plate, a first stage and second stage which can move between a first area and second area on the stage surface plate, a first interferometer configured to measure stage position relative to the stage surface plate in the first area, a second interferometer configured to measure stage position relative to the stage surface plate in the second area, and a third interferometer which is interposed between the first interferometer and the second interferometer and configured to measure stage position relative to the stage surface plate and to pass the measurement result obtained by one of the first interferometer and the second interferometer to the measurement result obtained by the other one of the first interferometer and the second interferometer, comprising steps of:

• measuring a gap between the optical system support and the stage surface plate;
• passing, when the first stage and the second stage swap by moving between the first area and the second area, the measurement result obtained by one of the first interferometer and the second interferometer to the measurement result obtained by the other one of the first interferometer and the second interferometer using the measurement result obtained by the third interferometer;
• and
• correcting the passed measurement result on the basis of the gap.