Lithographic apparatus and device manufacturing method
AssigneeASML Netherlands B.V.
InventorsMarcel Koenraad Marie Baggen, Dirk-Jan Bijvoet, Arjan Martin Van Der Wel
Life of this patent
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Abstract
A support constructed to support a patterning object, the patterning object being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, is disclosed, wherein the support comprises a plurality of structures having a plurality of local contact areas, respectively, on which the patterning object is disposed, in use, and a clamp configured to clamp the patterning object to the plurality of contact areas, wherein each structure is configured so that a local shear stiffness of each local contact area is substantially balanced with a local friction limit at each local contact area, respectively.
Claims18
A lithographic apparatus, comprising:
- a support constructed to support a patterning object, the patterning object being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam;
- wherein the support comprises a plurality of structures having a plurality of local contact areas, respectively, on which the patterning object is disposed, in use, and a clamp configured to clamp the patterning object to the plurality of local contact areas, wherein each structure is configured so that a local shear stiffness of each local contact area is substantially balanced in a ratio with a local friction limit at each local contact area, respectively,
- wherein for each structure, the ratio of the local shear stiffness and the local friction limit is a constant value.
A lithographic projection apparatus arranged to project a pattern from a patterning object onto a substrate, comprising:
- a support constructed to support the patterning object, the patterning object being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam;
- wherein the support comprises a plurality of structures having a plurality of local contact areas, respectively, on which the patterning object is disposed, in use, and a clamp configured to clamp the patterning object to the plurality of local contact areas, wherein each structure is configured so that the local shear stiffness of each local contact area is substantially balanced in a ratio with the local friction limit at each local contact area, respectively,
- wherein for each structure, the ratio of the local shear stiffness and the local friction limit is a constant value.
A device manufacturing method, comprising:
- supporting a patterning object on a support, the patterning object being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam;
- clamping a patterning object on a plurality of structures of a support, the plurality of structures having a plurality of local contact areas, respectively, each structure configured so that the local shear stiffness of each local contact area is substantially balanced in a ratio with the local friction limit at the each local contact area, respectively,
- wherein for each structure, the ratio of the local shear stiffness and the local friction limit is a constant value;
- and
- projecting the patterned radiation beam onto a substrate.
Dependencies are inferred from the claim text.