Electrical fuse structure for higher post-programming resistance

A semiconductor structure, comprising a fuselink laterally and directly abutting a cathode and an anode, wherein said fuselink has a first constant width throughout, said cathode has a second constant width, said anode has a third constant width, said first width is less than said second width and is less than said third width in a top view, and said cathode includes an undoped semiconducting material region and a first conducting material region;

• wherein said fuselink includes a first P-doped semiconducting material region and a second conducting material region, said first P-doped semiconductor material region in said fuselink laterally and directly contacts said undoped semiconducting material region in said cathode at an interface between said fuselink and said cathode, and said second conducting material region laterally and directly contacts said first conducting material region;
• and wherein said anode includes a second P-doped semiconducting material region and a third conducting material region, wherein said second P-doped semiconducting material region laterally and directly contacts said first P-doped semiconducting material region, and said third conducting material region laterally and directly contacts the second conducting material region.