Display device, manufacturing method thereof, and television receiver
AssigneeSemiconductor Energy Laboratory Co., Ltd.
InventorsShinji Maekawa, Shunpei Yamazaki, Hironobu Shoji
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Abstract
The present invention discloses a method for manufacturing a display device comprising the steps of forming a first film pattern using a photosensitive material over a substrate, forming a second film pattern in such a way that the first film pattern is exposed by being irradiated with a laser beam, modifying a surface of the second film pattern into a droplet-shedding surface, forming a source electrode and a drain electrode by discharging a conductive material to an outer edge of the droplet-shedding surface by a droplet-discharging method, and forming a semiconductor region, a gate-insulating film, and a gate electrode over the source electrode and the drain electrode.
Claims27
A display device comprising:
- a base layer comprising a metal material, and formed over a substrate;
- a gate electrode formed over a first portion of the base layer;
- a gate insulating film covering the gate electrode and the second portion of the base layer, the gate insulating film comprising a plurality of insulating layers;
- a semiconductor layer formed over the gate insulating film, the semiconductor layer comprising a microcrystalline semiconductor;
- source and drain regions formed over the semiconductor layer;
- source and drain electrodes formed over the source and drain regions, respectively;
- and
- a protective layer formed over source and drain electrodes;
- wherein the second portion of the base layer is in contact with the first portion of the base layer, and
- wherein the second portion of the base layer is insulated.
A display device comprising:
- a base layer comprising a metal material, and formed over a substrate;
- a gate electrode formed over a first portion of the base layer;
- a gate insulating film covering the gate electrode and the second portion of the base layer, the gate insulating film comprising a plurality of insulating layers;
- a semiconductor layer formed over the gate insulating film, the semiconductor layer comprising a microcrystalline semiconductor;
- source and drain regions formed over the semiconductor layer;
- source and drain electrodes formed over the source and drain regions, respectively;
- and
- a protective layer formed over source and drain electrodes;
- wherein a top surface of the semiconductor layer has an etched portion;
- wherein the second portion of the base layer is in contact with the first portion of the base layer;
- and
- wherein the second portion of the base layer is insulated.
A display device comprising:
- a base layer comprising a metal material, and formed over a substrate;
- a gate electrode formed over a first portion of the base layer;
- a gate insulating film covering the gate electrode and the second portion of the base layer, the gate insulating film comprising a plurality of insulating layers;
- a semiconductor layer formed over the gate insulating film, the semiconductor layer comprising a microcrystalline semiconductor;
- an insulating layer formed over the semiconductor layer;
- source and drain regions formed over the semiconductor layer and the plurality of insulating layers;
- source and drain electrodes formed over the source and drain regions respectively;
- and
- a protective layer formed over source and drain electrodes;
- wherein the second portion of the base layer is in contact with the first portion of the base layer;
- and
- wherein the second portion of the base layer is insulated.
Dependencies are inferred from the claim text.