Optical system having a cleaning arrangement
AssigneeKoninklijke Philips Electronics N.V.
InventorsPeter Zink, Gunther Hans Derra
Life of this patent
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Abstract
A cleaning arrangement for an optical system and in particular for an optical system designed for EUV radiation. The cleaning arrangement has a gas inlet (28) for a reactive gas (29). Contaminants (23) that have deposited on the surface of optical elements (110) are detached by the reactive gas. Also provided are getter surfaces (32) that are preferably arranged opposite the surfaces to be clean and by which the contaminants detached from these surfaces are absorbed. This absorption may take place as a result of condensation on the getter surface and also by chemical reaction.
Claims17
An optical system for providing a radiation having a beam path defined by optical elements and having a cleaning arrangement for cleaning surface to be cleaned, the cleaning arrangement comprising a reactive-gas inlet, a getter surface arranged off the beam path, and a getter-gas inlet aimed at the getter surface.
An optical system for providing a radiation having a beam path defined by optical elements and having a cleaning arrangement for cleaning surface to be cleaned, the cleaning arrangement comprising a reactive-gas inlet, a getter surface arranged off the beam path, and a getter-gas inlet having openings, wherein the openings of the getter-gas inlets are incorporated in the getter surface or are arranged at the getter surface.
A method of cleaning a surface comprising the acts of:
- providing radiation to the surface to be cleaned;
- applying a reactive gas to the surface to be cleaned for detaching contaminants from the surface to be cleaned;
- aiming a getter-gas inlet at a getter surface;
- and
- absorbing the detached contaminants by the getter surface by condensation and/or by chemical reaction.
Dependencies are inferred from the claim text.