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US 7,732,120 B2Granted
Method for making soft pellicles
AssigneeSematech, Inc.
InventorsPaul A. Zimmerman, Chris K. Van Peski
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Abstract
The present invention relates generally to the fields of semiconductor lithography. More particularly, it concerns methods, compositions, and apparatuses relating to 157 nm and 193 nm soft pellicles and the use of perfluorinated polymers in the creation of pellicles.
Claims22
A method for producing a pellicle comprising:
- (a) obtaining a film comprising a perfluorinated polymer;
- (b) heating the film;
- (c) irradiating the film with an electron beam in an amount sufficient to introduce cross-links into the perfluorinated polymer;
- and
- (d) exposing the irradiated film to F2 in under fluorination conditions.
2 more elements
Dependencies are inferred from the claim text.