Systems and methods for single integrated substrate cleaning and rinsing
AssigneeNano OM, LLC
InventorSuraj Puri
Life of this patent
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Abstract
Inventive methods and systems of cleaning patterned integrated circuit (“IC”) substrates are described. The cleaning methods of the present invention include: (1) providing the patterned integrated circuit substrate having thereon poly silicon lines adjacent to each other; (2) charging a solution, which contains at least a solute selected to promote cleaning of the patterned integrated circuit substrate, to produce a charged solution, wherein at least a portion of the solute is present as clusters in the charged solution; and (3) conveying the charged solution for cleaning the patterned integrated circuit substrate.
Claims20
A method for cleaning a patterned integrated circuit substrate, comprising:
- providing said patterned integrated circuit substrate having thereon poly silicon lines adjacent to each other;
- charging a solution, which contains at least a solute and a solvent, in a first chamber to produce a charged solution, that includes solute clusters, in which a solute is surrounded by a plurality of solvent molecules;
- conveying to a second chamber, which is different from said first chamber, said charged solution for cleaning said patterned integrated circuit substrate, and each of said first chamber and said second chamber include a bottom surface;
- and
- diluting said charged solution to produce a cleaning solution.
A method for producing a charged solution, comprising:
- acoustically vibrating a solution, which contains a solute and a solvent, in a first chamber to produce a charged solution that includes solute clusters, in which a solute is surrounded by many solvent molecules;
- diluting said charged solution to produce a more charged solution;
- conveying said more charged solution to a second chamber, which is different from said first chamber, for cleaning said integrated circuit substrate.
Dependencies are inferred from the claim text.