Apparatus for coating photoresist material
AssigneeHynix Semiconductor Inc.
InventorsHun Rock Jung, Hee Sung Kim
Life of this patent
Estimating the term…
Abstract
An apparatus for providing a photoresist material onto a substrate includes a lid housing at least one nozzle. A solvent supplying port inputs the solvent into the apparatus. A first solvent trap is provided below the nozzle and coupled to the solvent supplying port to hold a given amount of the solvent being input from the solvent supplying port. The first solvent trap is configured to prevent photoresist residues on the nozzle from being converted to powders. A second solvent trap is provided below the first solvent trap to receive the solvent from the first solvent trap. A solvent path is provided between the solvent trap and the solvent container to guide the solvent from the first solvent trap to the second solvent trap.
Claims18
An apparatus for coating a photoresist material onto a substrate, the apparatus comprising:
- a lid having one or more nozzle holders to house a nozzle;
- a solvent pipeline provided below the lid to guide the solvent to a solvent drain member;
- a solvent supplying port to supply the solvent into the solvent pipeline;
- a first solvent trap provided below the nozzle and configured to trap the solvent supplied by the solvent supplying port and prevent the formation of powders on the lid or the nozzle or both;
- a second solvent trap coupled to the solvent pipeline to trap the solvent received from the solvent pipeline;
- and
- the solvent drain member configured to receive the solvent from the second solvent trap,
- wherein the solvent supplying port is provided closer to the first solvent trap than the second solvent trap, the nozzle being positioned over the first and second solvent traps between coating operations.
An apparatus for providing a photoresist material onto a substrate, the apparatus comprising:
- a lid housing at least one nozzle;
- a solvent supplying port to input the solvent into the apparatus;
- a solvent pipeline to receive the solvent from the solvent supplying port and guide the solvent to a solvent drain member;
- a first solvent trap provided below the nozzle and coupled to the solvent supplying port to hold a given amount of the solvent being input from the solvent supplying port, the first solvent trap being provided proximate an upper portion of the solvent pipeline and substantially surrounding the upper portion of the solvent pipeline;
- a second solvent trap provided below the first solvent trap to receive the solvent from the first solvent trap via the solvent pipeline;
- and
- the solvent drain member configured to receive the solvent from the second solvent trap,
- wherein the first solvent trap is configured to prevent photoresist residues on the nozzle from being converted to powders, the nozzle being positioned over the first and second solvent traps between coating operations.
An apparatus for coating a photoresist material onto
- a substrate, the apparatus comprising:
- a lid having one or more nozzle holders to house a nozzle;
- a solvent pipeline provided below the lid to guide the solvent to a solvent drain member;
- a solvent supplying port to supply the solvent;
- a first solvent trap provided below the nozzle and configured to receive the solvent from the solvent supplying port and hold the solvent therein to prevent photoresist residues on the nozzle from hardening;
- a second solvent trap coupled to the solvent pipeline to trap the solvent received from the first solvent trap via the solvent pipeline;
- and
- the solvent drain member configured to receive the solvent from the second solvent trap,
- wherein the first solvent trap is configured so that the solvent being held in the first solvent trap is no more than 40 mm from a lower end of the nozzle, the nozzle being positioned over the first and second solvent traps between coating operations.
Dependencies are inferred from the claim text.