Printing apparatus and device manufacturing method
AssigneeASML Netherlands B.V.
InventorKlaus Simon
Life of this patent
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Abstract
The printing apparatus, presented herein, comprises a patterning device having a curved member that supports a stamp on its surface. The curved member is adapted to roll over a substrate to be printed on to transfer the pattern onto the substrate. An illumination system directs light onto the region of the substrate that is being printed in order to set a layer of resist, which has been sprayed onto the substrate. The light is directed via a pattern that is made on the surface of the stamp, thereby transferring the pattern to the substrate.
Claims18
A printing apparatus, comprising:
- a curved member carrying a stamp surface having a plurality of separate curved sides that form a periphery of the curved member, each of said curved sides defining a convex surface that intersects with two other of said curved sides, and each of said curved sides including a pattern, wherein, in use, said curved member is configured to roll over a substrate to transfer said pattern on said substrate such that, as said curved member rolls over said substrate, said pattern of each of said curved sides remains stationary relative to each of said curved sides;
- and
- an illumination system configured to direct light to a region of contact between said stamp surface and said substrate.
A printing apparatus for nanometric scale imprinting, comprising:
- a curved member carrying a stamp surface having a plurality of separate curved sides that form a periphery of the curved member, each of said curved sides defining a convex surface that intersects with two other of said curved sides, and each of said curved sides including a pattern wherein, in use, said curved member is configured to roll over a substrate to transfer said pattern onto said substrate such that, as said curved member rolls over said substrate, said pattern of each of said curved sides remains stationary relative to each of said curved sides;
- a resist mechanism configured to provide a layer of resist on said substrate;
- and
- an illumination system configured to direct light onto a region where said stamp surface has contacted said layer of resist on said substrate.
Dependencies are inferred from the claim text.