Fabrication of suspended carbon micro and nanoscale structures
AssigneeThe Regents of the University of California
InventorsChunlei Wang, Kartikeya Malladi, Rabih B. Zaouk, Marc J. Madou
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Abstract
Methods for the fabrication of suspended carbon structures using a negative photoresist that is exposed to a source of UV light, and a two step pyrolysis process. Ebeam lithography is used to define the suspended structures. The fabrication method described herein provides a novel carbon microfabrication technique, which has potential applications in carbon based electronics, sensors, batteries, microfluidics, etc.
Claims23
A method for forming suspended carbon structures comprising the steps of exposing a negative photoresist to UV light;
- patterning lines with electron beam lithography to the top surface of the photoresist between UV exposed areas;
- pyrolyzing the patterned negative photoresist in a two step pyrolysis process in a first inert gas atmosphere;
- and
- forming carbon posts with carbon structures suspended therebetween.
A method of forming suspended carbon structures comprising:
- exposing a negative photoresist to a source of UV light;
- patterning the photoresist using an electron beam writer;
- developing the photoresist;
- and
- heating the photoresist in an oxygen-free environment to a first temperature;
- heating the photoresist in an oxygen-free environment to a second temperature;
- and
- forming three dimensional C-MEMS structures comprising carbon posts with carbon structures suspended therebetween.
Dependencies are inferred from the claim text.