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US 7,682,479 B2Granted
Fin structure formation
AssigneeLam Research Corporation
InventorsZhi-Song Huang, S. M. Reza Sadjadi
Life of this patent
Estimating the term…
Abstract
A method for forming fin structures is provided. Sacrificial structures are provided on a substrate. Fin structures are formed on the sides of the sacrificial structures. The forming of the fin structures comprises a plurality of cycles, wherein each cycle comprises a fin deposition phase and a fin profile shaping phase. The sacrificial structure is removed.
Claims8
An apparatus for forming fin structures, comprising:
- a plasma processing chamber, comprising:
- a chamber wall forming a plasma processing chamber enclosure;
- a substrate support for supporting a substrate within the plasma processing chamber enclosure;
- a pressure regulator for regulating the pressure in the plasma processing chamber enclosure;
- at least one electrode for providing power to the plasma processing chamber enclosure for sustaining a plasma;
- a gas inlet for providing gas into the plasma processing chamber enclosure;
- and
- a gas outlet for exhausting gas from the plasma processing chamber enclosure;
- a gas source in fluid connection with the gas inlet, comprising;
- a sacrificial layer etchant source;
- a fin deposition gas source;
- and
- a fin profile shaping gas source;
- a controller controllably connected to the gas source and the at least one electrode, comprising:
- at least one processor;
- and
- computer readable media comprising:
- computer readable code for providing sacrificial structures on the substrate;
- computer readable code for forming fin structures on sides of the sacrificial structures, comprising a plurality of cycles, wherein each cycle comprises:
- a fin deposition phase which deposits a fin material, comprising:
- computer readable code for providing a deposition gas;
- computer readable code for forming a plasma from the deposition gas;
- computer readable code for depositing deposition material to form fins;
- and
- computer readable code for stopping the flow of the deposition gas;
- and
- a fin profile shaping phase which shapes the profile of the deposited fin material, comprising:
- computer readable code for providing a profile shaping gas different than the deposition gas;
- computer readable code for forming a plasma from the profile shaping gas;
- computer readable code for shaping the profile of the deposited deposition material;
- and
- computer readable code for stopping the flow of the profile shaping gas;
- and
- computer readable code for removing the sacrificial structures.
31 more elements
Dependencies are inferred from the claim text.