Lithographic apparatus having a drive system with coordinate transformation, and device manufacturing method

A method for moving a substrate support relative to a projection system in a lithographic apparatus, the method comprising:

• providing a substrate support configured to hold a substrate;
• providing a projection system configured to project a patterned radiation beam onto a target portion of the substrate;
• providing a drive system configured to move the substrate support along a trajectory, the drive system comprising
• a drive motor configured to move the substrate support in a first direction, and
• a drive motor configured to move the substrate support in a second direction;
• generating set-point data, including set-point coordinates, for moving the substrate support relative to the projection system in the first direction;
• generating set-point data, including set-point coordinates, for moving the substrate support relative to the projection system in the second direction;
• transforming the set-point coordinates of the first direction and the second direction, respectively, into set-point coordinates of a third direction and a fourth direction;
• generating motion data, including motion coordinates, for moving the substrate support relative to the projection system in the third direction, limiting the velocity in the third direction to a first maximum velocity;
• generating motion data, including motion coordinates, for moving the substrate support relative to the projection system in the fourth direction, limiting the velocity in the fourth direction to a second maximum velocity;
• and
• transforming the motion coordinates of the third direction and the fourth direction, respectively, into motion coordinates of the first direction and the second direction, respectively, for driving the first and second drive motors, respectively.

A drive system comprising:

• a first drive motor configured to move a substrate support in a first direction;
• a second drive motor configured to move the substrate support in a second direction;
• a first trajectory planner configured to generate set-point data, including set-point coordinates, for the first drive motor to move the substrate in the first direction;
• a second trajectory planner configured to generate set-point data, including set-point coordinates, for the second drive motor to move the substrate in the second direction;
• a first coordinate transformer configured to transform the set-point coordinates of the first direction and the second direction determined by the first and second trajectory planner, respectively, into set-point coordinates of a third direction and a fourth direction;
• a first set-point generator configured to generate motion data, including motion coordinates, for moving the substrate in the third direction, limiting the velocity in the third direction to a first maximum velocity;
• a second set-point generator configured to generate motion data, including motion coordinates, for moving the substrate in the fourth direction, limiting the velocity in the fourth direction to a second maximum velocity;
• and
• a second coordinate transformer configured to transform the motion coordinates of the third direction and the fourth direction determined by the first set-point generator and the second set-point generator, respectively, into motion coordinates of the first direction and the second direction, respectively, for driving the first and second drive motors, respectively.

A device manufacturing method comprising:

• projecting a patterned beam of radiation onto a substrate;
• providing a substrate support configured to hold the substrate;
• providing a drive system configured to move the substrate support along a trajectory, the drive system comprising
• a drive motor configured to move the substrate support in a first direction, and
• a drive motor configured to move the substrate support in a second direction;
• generating set-point data, including set-point coordinates, for moving the substrate support relative to a projection system in the first direction;
• generating set-point data, including set-point coordinates, for moving the substrate support relative to the projection system in the second direction;
• transforming the set-point coordinates of the first direction and the second direction, respectively, into set-point coordinates of a third direction and a fourth direction;
• generating motion data, including motion coordinates, for moving the substrate support relative to the projection system in the third direction, limiting the velocity in the third direction to a first maximum velocity;
• generating motion data, including motion coordinates, for moving the substrate support relative to the projection system in the fourth direction, limiting the velocity in the fourth direction to a second maximum velocity;
• and
• transforming the motion coordinates of the third direction and the fourth direction, respectively, into motion coordinates of the first direction and the second direction, respectively, for driving the first and second drive motors, respectively.

A tangible computer-readable medium having stored thereon, computer-executable instructions that, if executed by a computing device, cause the computing device to perform a method for moving a substrate support relative to a projection system in a lithographic apparatus, the method comprising:

• generating set-point data, including set-point coordinates, for moving the substrate support of the lithographic apparatus in a first direction;
• generating set-point data, including set-point coordinates, for moving the substrate support in a second direction;
• transforming the set-point coordinates of the first direction and the second direction, respectively, into set-point coordinates of a third direction and a fourth direction;
• generating motion data, including motion coordinates, for moving the substrate support in the third direction, limiting the velocity in the third direction to a first maximum velocity;
• generating motion data, including motion coordinates, for moving the substrate support in the fourth direction, limiting the velocity in the fourth direction to a second maximum velocity;
• and
• transforming the motion coordinates of the third direction and the fourth direction, respectively, into motion coordinates of the first direction and the second direction, respectively.

A device manufacturing method comprising:

• projecting a patterned beam of radiation onto a substrate with a projection system, the substrate held by a substrate support;
• and
• moving the substrate support along a trajectory, the moving including
• generating set-point data, including set-point coordinates, for moving the substrate support relative to the projection system in a first direction;
• generating set-point data, including set-point coordinates, for moving the substrate support relative to the projection system in a second direction;
• transforming the set-point coordinates of the first direction and the second direction, respectively, into set-point coordinates of a third direction and a fourth direction;
• generating motion data, including motion coordinates, for moving the substrate support relative to the projection system in the third direction, limiting the velocity in the third direction to a first maximum velocity;
• generating motion data, including motion coordinates, for moving the substrate support relative to the projection system in the fourth direction, limiting the velocity in the fourth direction to a second maximum velocity;
• and
• transforming the motion coordinates of the third direction and the fourth direction, respectively, into motion coordinates of the first direction and the second direction, respectively, for moving the substrate support along the trajectory.