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US 7,679,718 B2Granted
Immersion exposure technique
AssigneeCanon Kabushiki Kaisha
InventorHitoshi Nakano
Life of this patent
Estimating the term…
Abstract
An exposure apparatus including a projection optical system which projects a pattern of an original onto an exposed surface of a substrate, and a supply nozzle configured to supply the liquid through a supply opening into a gap between a final surface of the projection optical system and a part of the exposed surface of the substrate. The supply opening is arranged more distant than the final surface of the projection optical system from the exposed surface of the substrate.
Claims10
An exposure apparatus comprising:
- a stage configured to hold a substrate and to be moved;
- a projection optical system through which the substrate held by the stage is exposed to light, the substrate being exposed to light via a liquid that fills a gap between a final surface of the projection optical system and the substrate;
- a supply nozzle configured to supply the liquid to the gap, wherein an opening of the supply nozzle is higher than the final surface of the projection optical system;
- and
- a recovery nozzle configured to recover the liquid from the gap,
- wherein the supply nozzle and the recovery nozzle are arranged at the same side as the final surface, with respect to the substrate held by the stage, and are configured to locally immerse the substrate.
3 more elements
Dependencies are inferred from the claim text.