Exposure apparatus
AssigneeCanon Kabushiki Kaisha
InventorYuichi Iwasaki
Life of this patent
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Abstract
An exposure apparatus for exposing a pattern of a reticle onto a substrate includes a projection optical system for projecting the pattern onto a substrate, the exposure apparatus exposing the substrate through a flammable liquid that is filled in a space between the substrate and a final lens of the projection optical system closest to the substrate, and an explosion-proof unit for shielding an ignition source that can ignite the liquid or vapor of the liquid, from the liquid and the vapor.
Claims6
An exposure apparatus for exposing a pattern of a reticle onto a substrate, said exposure apparatus comprising:
- a projection optical system for projecting the pattern onto the substrate, said exposure apparatus exposing the substrate through a flammable liquid that is filled in a space between the substrate and said projection optical system;
- and
- an explosion-proof unit for shielding an ignition source that can ignite the liquid or vapor of the liquid, from the liquid and the vapor,
- wherein said explosion-proof unit includes a housing for housing the ignition source and said housing includes an inlet for introducing inflammable gas or dry air into said housing.
A device manufacturing method comprising the steps of:
- exposing a substrate using an exposure apparatus, the exposure apparatus comprising a projection optical system for projecting the pattern onto the substrate, said exposure apparatus exposing the substrate through a flammable liquid that is filled in a space between the substrate and said projection optical system, and an explosion-proof unit for shielding an ignition source that can ignite the liquid or vapor of the liquid, from the liquid and the vapor, wherein said explosion-proof unit includes a housing for housing the ignition source and said housing includes an inlet for introducing inflammable gas or dry air into said housing;
- and
- developing the substrate that has been exposed.
Dependencies are inferred from the claim text.