Lithographic processing cell, lithographic apparatus, track and device manufacturing method
AssigneeASML Netherlands B.V.
InventorsStefan Geerte Kruijswijk, Rard Willem De Leeuw, Paul Frank Luehrmann, Wim Tjibbo Tel, Paul Jacques Van Wijnen, Kars Zeger Troost
Life of this patent
Estimating the term…
Abstract
A rework station and a metrology device(s) are incorporated into a lithographic processing cell so that a faulty substrate can be reworked directly and reprocessed without, for example, an overhead involved in changing masks, etc.
Claims22
A lithographic processing cell, comprising:
- a lithographic apparatus configured to expose a substrate with a pattern;
- a track comprising one or more processing devices configured to process a substrate and a metrology station;
- a rework station configured to rework a substrate during the exposure, processing, or both, of one or more substrates;
- and
- a supervisory control system configured to control the lithographic apparatus and the track, the supervisory control system configured to control the rework station to rework a substrate based on a measurement or fault detected other than at the metrology station of the track.
A lithographic apparatus for use with a track, the track having a track control unit and a metrology station, the lithographic apparatus comprising:
- a support structure configured to hold a patterning device, the patterning device configured to impart a beam of radiation with a pattern in its cross-section;
- a substrate table configured to hold a substrate;
- a projection system configured to project the patterned beam onto a target portion of the substrate;
- and
- a lithographic apparatus control system with an interface configured to communicate with the track control unit of the tack, the lithographic apparatus control system configured to retort a measurement or fault detected with respect to a substrate to the track control unit via the interface for control of rework of the substrate by the track.
A track for use with a lithographic apparatus the track comprising:
- one or more processing devices configured to process one or more substrates;
- a metrology station;
- a rework station configured to rework a substrate;
- and
- a track control unit provided with an interface configured to communicate with a lithographic apparatus control system of the lithographic apparatus, the track control unit configured to control the rework station to rework a substrate based on a measurement or fault detected other than at the metrology station of the track.
A device manufacturing method, comprising:
- exposing a substrate of a lot the lot comprising a plurality of substrates, to a pattern using a lithographic projection apparatus in a lithographic processing cell, processing the substrate using a track, having a metrology station, in the lithographic processing cell, or both exposing and processing;
- measuring or detecting a fault, other than at the metrology station of the track, with respect to the substrate in the lithographic processing cell;
- stripping resist from the exposed substrate using a rework station in the lithographic processing cell if a fault has been detected or measured with respect to the substrate;
- re-coating with resist the stripped substrate;
- and
- re-exposing the re-coated substrate using the lithographic apparatus without the re-coated substrate leaving the lithographic processing cell.
Dependencies are inferred from the claim text.