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AssigneeASML Netherlands B.V.
InventorsJohannes Onvlee, Reinder Teun Plug, Hubert Marie Segers, David Christopher Christopher Ockwell, Paul Jacques Van Wijnen, Suzan Leonie Auer-Jongepier
Estimating the term…
A lithographic apparatus configured to transfer a pattern from a patterning device onto a substrate includes an integrated post-exposure bake device, the post-exposure bake device configured to subject the substrate to a predefined temperature cycle. A post-exposure bake step of the substrate (a temperature cycle) is executed within a predetermined time period after the transfer of the pattern. The lithographic apparatus may be combined with a processing system having one or more processing modules. More efficient use may be made of the combination, allowing flexibility for a device manufacturing method.
A lithographic apparatus configured to transfer a pattern from a patterning device onto a substrate, comprising an integrated post-exposure bake device, the post-exposure bake device configured to subject the substrate to a predefined temperature cycle, wherein the lithographic apparatus is not configured to coat the substrate, or not configured to develop the substrate, or not configured to coat and develop the substrate.
A combination of a lithographic apparatus configured to transfer a pattern from a patterning device onto a substrate and a processing system, wherein the lithographic apparatus comprises an integrated post-exposure bake device, the post-exposure bake device configured to subject the substrate to a predefined temperature cycle and the lithographic apparatus is not configured to coat the substrate, or not configured to develop the substrate, or not configured to coat and develop the substrate, and wherein the processing system comprises a substrate interface configured to provide a substrate to the lithographic apparatus and to receive a substrate from the lithographic apparatus.
Dependencies are inferred from the claim text.