Methods and compositions for providing photoresist with improved properties for contacting liquids

A method comprising:

• providing a photolithographic scanner, said photolithographic scanner comprising a light source and a last lens element, said light source producing light having a wavelength, said last lens element having a refractive index;
• providing an index-matching liquid (IML) based on said wavelength and said refractive index;
• providing a photoresist, said photoresist comprising a combination of one or more IML-non-soluble additives and one or more IML-soluble-additives and other constituents wherein form and concentration are determined by properties of said IML;
• binding said other constituents of said photoresist to said IML-non-soluble additives;
• placing said IML in contact with both said last lens element and said photoresist;
• preventing diffusion of said IML-non-soluble additives and said other bound constituents into said IML;
• thus neutralizing acid diffusing from said IML into said photoresist;
• promoting diffusion of said IML-soluble-additives from said photoresist into said IML and creating a concentration of said IML-soluble additives in said IML;
• thus improving wettability and creating surface inhibition of surface layer of said photoresist;
• and
• illuminating said IML and said photoresist with said light from said last lens element.