Mask for exposure and method of manufacturing the same

A mask for exposure, comprising:

• a transparent substrate having a first concave portion in a device region and a second concave portion in a monitor region;
• two first light-shielding device patterns, which are formed on said transparent substrate in said device region at a first gap and severally extend from the both sides of said first concave portion over the first concave portion, and at least one of the first light-shielding device patterns is not in contact with the first concave portion;
• a second light-shielding device pattern, which is formed on a flat surface of said transparent substrate in said device region at a second gap from said first light-shielding device pattern;
• two first light-shielding monitor patterns for measuring a phase difference of an exposure light, where the first light-shielding monitor patterns are formed on said transparent substrate in said monitor region at a third gap wider than said first gap and severally extend from the both sides of said second concave portion over the second concave portion, and at least one of the first light-shielding monitor patterns is not in contact with the second concave portion;
• and
• a second light-shielding monitor pattern for measuring the phase difference of the exposure light, where the second light-shielding monitor pattern is formed on a flat surface of said transparent substrate in said monitor region at a fourth gap wider than said second gap from said first light-shielding monitor pattern, wherein
• a first step is formed on the top surface of said first light-shielding device pattern, which has a first distance from an end surface of said first light-shielding device pattern closer to said second light-shielding device pattern, and the height of the top surface of said first light-shielding device pattern on a portion extending from the first step over said first concave portion is made lower than a height of a portion of said first light-shielding device pattern closer to said end surface, and
• a second step is formed on the top surface of said first light-shielding monitor pattern, which has a second distance shorter than said first distance from an end surface of said first light-shielding monitor pattern closer to said second light-shielding monitor pattern, and the height of the top surface of said first light-shielding monitor pattern on a portion extending from the second step over said second concave portion is made lower than a height of a portion of said first light-shielding monitor pattern closer to said end surface.

A method of manufacturing a mask for exposure, comprising:

• forming a light-shielding film on a transparent substrate;
• patterning said light-shielding film to form, in the device region of said transparent substrate, two first light-shielding device patterns at a first gap and a second light-shielding device pattern at a second gap from the first light-shielding device pattern, and to form, in the monitor region of said transparent substrate, two first light-shielding monitor patterns, which have a third gap wider than said first gap and have a width equal to or less than a width of said first light-shielding device pattern, and a second light-shielding monitor pattern at a fourth gap wider than said second gap from the first light-shielding monitor pattern;
• forming a resist pattern that covers said second light-shielding device pattern and said second light-shielding monitor pattern and has a first window where a part of the top surface of said two first light-shielding device patterns is exposed and a second window where a part of the top surface of said two first light-shielding monitor patterns is exposed;
• etching said transparent substrate through said first and second windows to form a first concave portion on said transparent substrate between said two first light-shielding device patterns and to form a second concave portion on said transparent substrate between said two first light-shielding monitor patterns;
• performing wet etching to said transparent substrate through said first and second windows to expand widths of said first and second concave portions, and thus to extend said first light-shielding device patterns over said first concave portion and to extend said first light-shielding monitor patterns over said second concave portion, with at least one of the first light-shielding device patterns not in contact with the first concave portion, and at least one of the first light-shielding monitor patterns not in contact with the second concave portion;
• removing said resist pattern;
• and
• allowing light pass through said second concave portion between said two first light-shielding monitor patterns and through the transparent substrate between said first light-shielding monitor pattern and said second light-shielding monitor pattern to measure the phase difference of transmitted light between said second concave portion and said substrate as a first phase difference, and then confirming whether or not the first phase difference is 180 degrees.

A method of manufacturing a mask for exposure, comprising:

• forming a light-shielding film on a transparent substrate;
• patterning said light-shielding film to form, in the device region of said transparent substrate, two first light-shielding device patterns at a first gap and a second light-shielding device pattern at a second gap from the first light-shielding device pattern, and to form, in the monitor region of said transparent substrate, two first light-shielding monitor patterns at a third gap wider than said first gap and a second light-shielding monitor pattern at a fourth gap wider than said second gap from the first light-shielding monitor pattern;
• forming a resist pattern that covers said second light-shielding device pattern and said second light-shielding monitor pattern and has a first window where top surfaces of said two first light-shielding device patterns are exposed and a second window where top surfaces of said two first light-shielding monitor patterns are exposed, and that overlaps said first light-shielding device pattern with a first overlap amount and overlaps said first light-shielding monitor pattern with a second overlap amount smaller than said first overlap amount;
• etching said transparent substrate through said first and second windows to form a first concave portion on said transparent substrate between said two first light-shielding device patterns and to form a second concave portion on said transparent substrate between said two first light-shielding monitor patterns;
• performing wet etching to said transparent substrate through said first and second windows to expand the width of said first and second concave portions and thus to extend said first light-shielding device patterns over said first concave portion and to extend said first light-shielding monitor patterns over said second concave portion, with at least one of the first light-shielding device patterns not in contact with the first concave portion, and at least one of the first light-shielding monitor patterns not in contact with the second concave portion;
• removing said resist pattern;
• and
• allowing light pass through said second concave portion between said two first light-shielding monitor patterns and through the transparent substrate between said first light-shielding monitor pattern and said second light-shielding monitor pattern to measure the phase difference of transmitted light between said second concave portion and said substrate as a first phase difference and then confirming whether or not the first phase difference is 180 degrees.