System and method for treating substrates

A method for treating, comprising:

• conveying a mask using a conveying device at least between a position outside a processing chamber and a position inside the processing chamber, wherein said processing chamber is provided with a substrate access closable by a closing body;
• disposing a substrate in said processing chamber using a substrate conveyor;
• covering a part of a surface to be treated of said substrate by said mask;
• simultaneously holding said mask and said closing body using the conveying device;
• and
• carrying out a vacuum process in the processing chamber to treat the part of the said substrate surface not covered by the mask.

A system for treating substrates, comprising:

• a processing chamber having a substrate access closable by a closing body;
• a movable substrate holder configured to keep a substrate in said processing chamber;
• and
• a mask holder configured to keep a mask in a substrate covering position in the processing chamber, wherein at least said substrate holder comprises a positioning device configured to position the substrate holder and the mask relative to each other,
• wherein said mask holder is configured to simultaneously hold said mask and said closing body.