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US 7,677,958 B2Granted
Retaining ring with flange for chemical mechanical polishing
AssigneeApplied Materials, Inc.
InventorsDan A. Marohl, Ming-Kuei Tseng
Life of this patent
Estimating the term…
Abstract
A retaining ring has a generally annular body with a top surface, a bottom surface, an inner diameter surface, and an outer diameter surface. The outer diameter surface includes an outwardly projecting flange having a lower surface, and the bottom surface includes a plurality of channels.
Claims9
A retaining ring for a carrier head for use in chemical mechanical polishing, comprising:
- an inner diameter with a continuously tapered surface and a cylindrical vertical surface, wherein the continuously tapered surface is adjacent to an upper surface of the retaining ring and the cylindrical vertical surface is adjacent to a bottom surface of the retaining ring, wherein the continuously tapered surface tapers inwardly from top to bottom so that the inner diameter of the retaining ring is smaller toward the bottom surface than toward the upper surface of the retaining ring, the continuously tapered surface forms an angle of about 80° with the top surface, and the bottom surface is configured to contact a polishing pad during polishing.
Dependencies are inferred from the claim text.