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US 7,635,652 B2Granted
Mask with hydrophobic surface
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorChih-Wing Chang
Life of this patent
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Abstract
A mask with hydrophobic surface. The mask includes a substrate, a plurality of patterns formed on the substrate, and a self-assembled monolayer (SAM) formed on the substrate exposed by the patterns. The self-assembled monolayer includes an alkyltrichlorosilane-based layer such as octadecyltrichlorosilane (OTS) or perfluorodecyltrichlorosilane (FDTS) and formed by vapor process or solution process.
Claims11
A mask with hydrophobic surface, comprising:
- a substrate;
- a plurality of patterns formed on the substrate;
- and
- a self-assembled monolayer (SAM) formed on the substrate exposed by the patterns, wherein the self-assembled monolayer comprises perfluorodecyltrichlorosilane (FDTS).
1 more element
A mask with hydrophobic surface, comprising:
- a substrate;
- a plurality of patterns formed on the substrate;
- and
- a fluorocarbon layer formed on the substrate exposed by the patterns.
1 more element
Dependencies are inferred from the claim text.