US 7,634,744 B2Granted

Semiconductor memory device and method for generating ROM data pattern

AssigneePanasonic Corporation

InventorsYoshihiko Sumimoto, Kiyoto Ohta

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Abstract

By simplifying the shape of memory cell diffused mask patterns, the patterns are formed stably and the yield of a semiconductor memory device is improved. Adjacent 2-bit memory cell transistors are formed with one diffused mask pattern, the diffused mask patterns are arranged on a memory cell array, and metal lines are used as source common lines for the memory cells formed at the diffused mask patterns. In this way, that is, by using 2-bit rectangular diffused mask patterns as the memory cell diffused mask patterns and using the metal lines as the source common lines instead of diffused layers, the shape of the memory cell diffused mask patterns is simplified. And furthermore, the continuity of the memory cell diffused mask patterns used as actual memory cells is kept, accuracy in forming the actual memory cell diffused mask patterns is improved, and the yield of the semiconductor memory device is improved.

Claims4

Dependent claims

A semiconductor memory device comprising:

plural memory cell transistor pairs;
plural metal lines supplied with a predetermined power supply potential;
and
plural memory cell read data lines, wherein:
the memory cell transistor pairs are arranged in a row-column array,
two memory cell transistors constituting each memory cell transistor pair of the plural memory cell transistor pairs share a common source diffusion region, and the source diffusion region of the two memory cell transistors constituting each memory cell transistor pair of the plural memory cell transistor pairs is separated from another source diffusion region of another two memory cell transistors constituting another memory cell transistor pair of the plural memory cell transistor pairs,
the source diffusion regions of the memory cell transistor pairs in the same row are connected by one common metal line of the plural metal lines,
a first metal wiring layer, which is a lowest layer, is used as the plural metal lines supplied with the predetermined power supply potential, and
the plural memory cell read data lines are provided in such a manner that one of the memory cell read data lines is provided for each column of the array, and a second metal wiring layer or an even upper wiring layer is used as the plural memory cell read data lines.

6 more elements

Dependencies are inferred from the claim text.