Lithographic apparatus and method
AssigneeASML Netherlands B.V.
InventorsBudiman Sutedja, Rudy Jan Maria Pellens, Johannes Paulus Adrianus Maria Van Den Heuvel, Paulus Wilhelmus Leonardus Van Dijk
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Abstract
According to an aspect of the present invention, there is provided a lithographic apparatus that includes a substrate carrier arranged to hold a substrate in position using an electrostatic force. The substrate carrier is provided with an integral power source. The apparatus also includes a substrate table for holding the substrate carrier.
Claims19
A lithographic apparatus comprising:
- a substrate carrier arranged to hold a substrate in position using an electrostatic force, the substrate carrier comprises a first layer of material and a second layer of material that is electrically insulated from the first layer of material, the substrate carrier being provided with an integral power source configured to provide a potential difference between the first layer of material and the second layer of material;
- and
- a substrate table for holding the substrate carrier.
A substrate carrier arranged to hold a substrate in position using an electrostatic force, the substrate carrier comprising a first layer of material and a second layer of material that is electrically insulated from the first layer of material, wherein the substrate carrier is provided with an integral power source configured to provide a potential difference between the first layer of material and the second layer of material.
Dependencies are inferred from the claim text.