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US 7,626,680 B2Granted
Exposure apparatus and device fabrication method using the same
AssigneeCanon Kabushiki Kaisha
InventorsTetsuya Mori, Yuichi Osakabe, Tadayasu Nishikawa
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Abstract
An exposure apparatus includes an original-form stage for holding an original form, a projection optical system for introducing light from the original form into an object to be exposed, and a detection optical system for detecting positions at plural points on the original form, in an optical-axis direction of the projection optical system, wherein a space for enclosing the original-form stage is different from a space for enclosing at least part of the detection optical system.
Claims2
An exposure apparatus comprising:
- a projection optical system for transferring a pattern on an original form onto a photosensitive plate;
- an original-form stage for holding the original form, said original-form stage including a non-movable part and a movable part moving over the non-movable part while holding the original form;
- a surface position detector for obtaining information about surface positions of the original form, said surface position detector being incorporated into the non-movable part;
- an optical element for separating a first space that encloses said surface position detector from a second space that encloses the movable part, said optical element being arranged between said surface position detector and the movable part;
- and
- an air-conditioner mechanism for individually air-conditioning the first space and the second space.
3 more elements
Dependencies are inferred from the claim text.