US 7,622,720 B2 · Exposure device

Abstract

The present invention relates to an exposure device for forming predetermined patterns onto an object. The exposure device includes an optical source for emitting a ray, an aperture member including first and second opening windows and a detection window, first and second reflective optical elements for reflecting the first and second light beams that have passed through the first and second opening windows, respectively, and an optical sensor for detecting intensity of the ray from the optical source which has passed through the detection window, the optical sensor being placed close to an area between the first and second reflective optical elements.

Drawings

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Drawings

Claims15

Dependent claims

An exposure device for forming predetermined patterns onto an object, comprising:

an optical source for emitting a ray containing a UV spectral line;
an aperture member including first and second opening windows and a detection window, the first and second opening windows through which the ray from the optical source is split into first and second light beams, respectively, the detection window through which intensity of the ray is detected;
first and second reflective optical elements for reflecting the first and second light beams that have passed through the first and second opening windows, respectively;
and
an optical sensor for detecting the intensity of the ray from the optical source which has passed through the detection window, the optical sensor being placed adjacent an area between the first and second reflective optical elements.

2 more elements

An exposure device for forming predetermined patterns onto an object, comprising:

first and second optical sources for emitting rays containing a UV spectral line;
first and second power supply sources for supplying electric power to the first and second optical sources;
a first aperture member for first and second opening windows and a first detection window, the first and second opening windows through which the ray from the first optical source is split into first and second light beams, the first detection window through which intensity of the ray from the first optical source is detected;
a second aperture member for third and fourth opening windows and a second detection window, the third and fourth opening windows through which the ray from the second optical source is split into third and fourth light beams, the second detection window through which intensity of the ray from the second optical source is detected;
a first optical sensor for detecting the intensity of the ray from the first optical source through the first detection window;
a second optical sensor for detecting the intensity of the ray from the second optical source through the second detection window;
a power supply controller for controlling the first and second power supply sources in such a way that the intensities detected by the first and second optical sensors fall within a predetermined range;
first and second spatial light modulators for spatially modulating the first and second light beams that have passed through the first and second opening windows, based on inputted first and second image data, respectively;
third and fourth spatial light modulators for spatially modulating the third and fourth light beams that have passed through the third and fourth opening windows, based on inputted third and fourth image data, respectively;
and
a controller for controlling operations of the first to forth spatial light modulators, based on difference between the intensities detected by the first and second optical sensors.

8 more elements

Dependencies are inferred from the claim text.

Description7,392 words

Summary2,089 words

#This application claims the benefit of Japanese Patent Application 2007-083881 filed on Mar. 28, 2007, the disclosure of which is incorporated herein by reference.

#1. Field of the Invention

#The present invention relates to an exposure device for forming patterns on a surface of a flat-sheet material, including a substrate for an electronic circuit, a glass substrate for an LCD and a glass element substrate for a PDP.

Brief description of the drawings13 figures

#For more complete understanding of the present invention and the advantages hereof, reference is now made to the following description taken in conjunction with the accompanying drawings wherein:

#FIG. 1 is a schematically perspective view depicting an exposure device 100 according to one embodiment of the present invention;

#FIG. 2 is a schematic view depicting first lighting systems 30-1 and 30-2 of the exposure device 100;

Detailed description5,041 words

#<Whole Structure of Exposure Device>

#FIG. 1 schematically shows an exposure device 100 according to an embodiment of the present invention. This exposure device 100 mainly includes first lighting systems 30-1 and 30-2, second lighting systems 37-1 to 37-8, spatial light modulation systems (thereinafter referred to as “DMDs”) 41-1 to 41-8, projection optical systems 60-1 to 60-8, and an object table 90. The reason why the two first lighting systems (30-1 and 30-2) are used is to irradiate an object CB widely. These first lighting systems 30-1 and 30-2 contain a first high-pressure mercury lamp 10-1 and a second high-pressure mercury lamp 10-2 (see FIG. 2), respectively.

#FIG. 2 schematically shows the first lighting systems 30-1 and 30-2. Since both lighting systems have the identical structure, only the first lighting system 30-1 will be described below.

Facts

Application

12/079,435Filed 27 Mar 2008

Priority

JP 2007-08388128 Mar 2007

Published

US 2008/0258069 A123 Oct 2008

Granted

24 Nov 2009

Term ends

27 Mar 2028

Estimated · how

20 years from earliest known nonprovisional domestic filing plus recorded patent term adjustment. Maintenance-fee lapses, terminal disclaimers and statutory extensions have not been checked. The continuity chain may be incomplete; this is not an enforceability determination.

Classification3 codes

G03F 7/70291
Mask effects on the imaging process: addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid…
G03F 7/70275
Mask projection systems: multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
G03F
Photomechanical production of textured or patterned surfaces

Timeline

28 Mar 2007Priority claimedJP 2007-083881
27 Mar 2008Application filedUS 12/079,435
27 Mar 2008Assigned to Orc Manufacturing Co., Ltd.assignment of assignor's interest
23 Oct 2008PublishedUS 2008/0258069 A1
24 Nov 2009GrantedUS 7,622,720 B2
12 Oct 2026TodayWithin its term
27 Mar 2028Term endsEstimated

Exposure device

Life of this patent

Exposure device

Life of this patent

Life of this patent

Abstract

Drawings

Drawings

Claims15

Description7,392 words

Drawings

Classification3 codes

Life of this patent

Description7,392 words