Global shape definition method for scatterometry

An interactive design interface for creating a theoretical model of a multi-layer semiconductor sample having one or more geometrical features formed thereon, said feature having at least one height and width, said interface comprising:

• a first display region for inputting information defining parameters of the sample, said parameters including the number of layers, layer thickness, material composition of the layers and the height and width of the geometrical feature;
• a second display region for displaying a representation of a model of the sample based on the information input into the first display region, said model further including at least one control point corresponding to the height of the feature and at least one control point corresponding to the width of the feature, said second display region permitting the user to modify the position of the control points to vary the shape of the feature;
• and
• a third display region for displaying theoretical optical response data, said data being calculated based on the information contained about the sample in the first and second display regions.

A method of creating a theoretical model of a semiconductor sample having one or more geometrical features formed thereon:

• (a) displaying an initial representation of the model, said model including layers and at least one geometrical feature having at least one height and width, said representation including at least one control point corresponding to the height and at least one control point corresponding to the width;
• (b) adjusting the model by one or more of:
• (i) adding control points to specify more complex shapes;
• (ii) adding control points to reflect additional features;
• or
• (iii) moving control points to change the shape of the feature;
• and
• (c) storing the adjusted model in a database.