Semiconductor memory device with dual storage node and fabricating and operating methods thereof
AssigneeSamsung Electronics Co., Ltd.
InventorsSang-min Shin, Bon-jae Koo, Yoon-dong Park, Young-soo Park
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Abstract
A semiconductor memory device with a dual storage node structure as well as methods of fabricating and operating such a device are provided. The semiconductor memory device includes a substrate, a first transistor formed on the substrate, a first storage node connected to a source region of the first transistor, a second storage node connected to a drain region of the first transistor, and a plate line commonly contacting the first storage node and the second storage node.
Claims10
An operating method of a semiconductor memory device, the semiconductor memory device including a substrate, a first transistor formed on the substrate, a first storage node connected to a source region of the first transistor, a second storage node connected to a drain region of the first transistor, and a plate line commonly contacting the first storage node and the second storage node, the operating method comprising:
- floating the drain region while maintaining the first transistor turned off;
- and
- generating a first electric potential difference between the source region of the first transistor and the plate line.
Dependencies are inferred from the claim text.