Surface form measuring apparatus and stress measuring apparatus and surface form measuring method and stress measuring method
AssigneeDainippon Screen Mfg. Co., Ltd.
InventorsKumiko Akashika, Masahiro Horie
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AssigneeDainippon Screen Mfg. Co., Ltd.
InventorsKumiko Akashika, Masahiro Horie
Estimating the term…
In a stress measuring apparatus, reflected light of light emitted to a substrate through an objective lens is received by a light shielding pattern imaging part, to acquire an image of a light shielding pattern positioned at an aperture stop part of an optical system. A control part obtains gradient vectors of the substrate in a plurality of gradient vector measurement areas and surface form of the substrate on the basis of outputs of the light shielding pattern imaging part, to obtain a stress in a film formed on the substrate. Since light directed through the objective lens becomes approximately parallel rays of light on the substrate, measurement can be performed without focusing on each gradient vector measurement area and the surface form of the substrate can be obtained easily and rapidly. Consequently, it is possible to obtain a stress in the film formed on the substrate easily and rapidly.
A surface form measuring apparatus for measuring surface form of an object, comprising:
A stress measuring apparatus for measuring a stress in a film formed on an object, comprising;
A surface form measuring method of measuring surface form of an object, comprising the steps of:
A stress measuring method of measuring a stress in a film formed on an object, comprising the steps of;
Dependencies are inferred from the claim text.